TECHNOLOGIES & APPLICATIONS
LINEAR ION-PLASMA SOURCES ON THE BASES
OF ACCELERATOR WITH CLOSED ELECTRON DRIFT
Linear ion-plasma sources on the basis of the accelerator with closed electron drift developed at the Institute of High Current Electronics are intended for final cleaning of large-area substrates (in particular, architectural glasses) previously to the coating deposition and ion assisting of the coating deposition process.
A distinctive feature of the devices is using an additional hollow cathode discharge allowing increasing the efficiency of the dielectric substrate cleaning at low operating voltages. The source operation is characterized by simultaneous existence in the working chamber of the hollow cathode discharge volume plasma and ion flow formed by the closed drift accelerator. Beam ion energy makes up 200 - 400 eV that is optimum for ion cleaning and ion assisting.
| Supply voltage | 600 - 1000 V |
| Linear current density | Up to 2 A/m |
| Operating pressure range | 0.05 - 0.3 Pa |
| Cooling | water |
| Length | Up to 2.5 m |
Ion distribution by energies for different observation angles.
Different variants of the ion - plasma source magnetic system allow making simultaneous cleaning of one or two flat substrates.
For further information please contact:
Nikolay F. Kovsharov
Head of Sector, Candidate of techn. sci.
Phone: (3822) 49-14-20
Andrei A. Solovjev
Ph. D. (techn.), Acting Laboratory Head
Phone: (3822) 49-16-51
E-mail: andrewsol@mail.ru
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